Article
Designing Thin Film for Wavelength Division Multiplexing
There are two designs of thin film narrow band-pass filters with several cavities. These filters, which are the most used filtering technologies, have been crucial to the advancement of technology in contemporary optical communication systems. This work focusses on a theoretical investigation of optoelectronics physics, which is primarily connected to the design and analysis of this kind of filter. The technology of thin film multicavity filters is briefly introduced. We'll cover some recent developments in thin-film multi-cavity technology design. TiO2 and SiO2 are the two materials used in these designs as high and low index. The three and four wavelengths (730,800 and additionally 835,432,560 and 774 nm) can be detected by these wavelengths, which range from 600 to 900 nm. The filter's function is to filter fused silica with index 4.23.
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